Mechanical Behaviour of Sputtered Aluminium Thin Films under High Sliding Loads

Mwema, Fredrick Madaraka; Akinlabi, Esther Titilayo; Oladijo, Oluseyi Philip

dc.contributor.author	Mwema, Fredrick Madaraka
dc.contributor.author	Akinlabi, Esther Titilayo
dc.contributor.author	Oladijo, Oluseyi Philip
dc.date.accessioned	2019-06-13T07:09:38Z
dc.date.available	2019-06-13T07:09:38Z
dc.date.issued	2019-03-22
dc.identifier.citation	doi:10.4028/www.scientific.net/KEM.796.67	en_US
dc.identifier.issn	1662-9795
dc.identifier.uri	http://41.89.227.156:8080/xmlui/handle/123456789/903
dc.description.abstract	In this work, the wear behaviour of thin aluminium thin films (thickness range of 750- 1500 nm) deposited on rough stainless-steel substrate through radio-frequency (rf) magnetron sputtering at varying substrate temperature (Ts) was studied. The films were studied under extremely high wear loads of 30 N and 50 N. The coefficient of friction and material loss are characterised as functions of the Ts of the deposited aluminium films. It was observed that due to the evolving microstructural and roughness properties of the films, the material behaviour of the films under extremely high sliding loads significantly depend on the substrate temperature. The most significant coefficient of friction was observed at 60o C and 80o C, and highest material loss was recorded at 100o C. The material loss and variation of the coefficient of friction were related to the morphology (porosity and roughness) of the sputtered thin films.	en_US
dc.language.iso	en	en_US
dc.publisher	Key Engineering Materials	en_US
dc.relation.ispartofseries	Volume 796;
dc.subject	Aluminium; thin films; sputtering; substrate temperature; wear	en_US
dc.title	Mechanical Behaviour of Sputtered Aluminium Thin Films under High Sliding Loads	en_US
dc.type	Article	en_US