Abstract:
In this chapter, the current state of the art in optimization of thin film deposition processes is discussed.
Based on the reliable and credible published results, the study aims to identify the applications of various optimization techniques in the thin film deposition processes, with emphasis on physical deposition
methods. These methods are chosen due to their attractive attributes over chemical deposition techniques
for thin film manufacturing. The study identifies the critical parameters and factors, which are significant in designing of the optimization algorithms based on the specific deposition methods. Based on the
specific optimization studies, the chapter provides general trends, optimization evaluation criteria, and
input-output parameter relationships on thin film deposition. Research gaps and directions for future
studies on optimization of physical vapor deposition methods for thin film manufacturing are provided.
