dc.contributor.author |
Mwema, Fredrick Madaraka |
|
dc.contributor.author |
S.Țălu |
|
dc.contributor.author |
A Ghaderi |
|
dc.contributor.author |
K Stępień |
|
dc.date.accessioned |
2020-05-15T10:45:40Z |
|
dc.date.available |
2020-05-15T10:45:40Z |
|
dc.date.issued |
2019-10 |
|
dc.identifier.issn |
1757-899X |
|
dc.identifier.uri |
https://iopscience.iop.org/article/10.1088/1757-899X/611/1/012016 |
|
dc.identifier.uri |
http://repository.dkut.ac.ke:8080/xmlui/handle/123456789/1130 |
|
dc.description.abstract |
In this work, an advanced analysis of Cu/Fe NPs thin films using atomic force
microscopy (AFM) has been discussed to characterize at nanoscale 3-D surface microtexture.
Samples of Cu/Fe thin films were fabricated by Direct Current-Magnetron Sputtering
technique with two controlled thicknesses (group I: Cu 55 nm/Fe 55 nm and group II: Cu 55
nm/Fe 70 nm) in specific conditions of pressure and power. The results obtained from
experimental measurements suggested that the surface of group I has the lowest values for
fractal dimension (D = 2.28 ± 0.01) and root mean square height (Sq = 4.40 ± 0.1 nm); while
the highest values for fractal dimension (D = 2.31 ± 0.01) and root mean square height (Sq =
4.67 ± 0.1 nm) were found in group II. Stereometric and fractal analyses applied for thin films
are modern tools for accurate quantitative morphometric characterisation. |
en_US |
dc.language.iso |
en |
en_US |
dc.publisher |
IOP Conf. Series: Materials Science and Engineering |
en_US |
dc.title |
Advanced Micromorphology Analysis of Cu/Fe NPs Thin Films |
en_US |
dc.type |
Article |
en_US |